photolithography (Also photolithographies) : Related Words Words similar in meaning to photolithography

photolithography«
photo-«
wafer«
printing«
photoresist«
lithography«
plate«
excimer laser lithography«
photozincography«
resist«
minimum feature size«
photomask«
wavelength«
photolithographic«
excimer laser«
photolithographer«
photolithograph«
mask«
light«
immersion lithography«
photolith«
wafer surface«
photographic«
microcircuit«
proximity lithography«
lithophotography«
lithographic«
pattern«
entire wafer«
substrate«
extreme ultraviolet lithography«
resolution«
layer«
image«
numerical aperture«
projection system«
water repellent layer«
semiconductor industry«
exposure«
positive photoresist«
computational lithography«
mercury arc lamp«
lithography tool«
gap distance«
laser«
thickness«
bitumen«
nanometer«
lens«
process«
exposure system«
optical lithography«
liquid«
nanoimprint lithography«
contact printing«
spin coating«
moore ’s law«
contact«
electron laser«
developer«
coefficient«
stepper«
depth«
silicon dioxide«
light intensity«
data file«
refractive index«
micrometer«
scanner«
frequency«
aspect ratio«
chemistry«
transistor«
material«
wet etch process«
uv excimer laser«
target design rule«
sub-193nm wavelength«
stepper/scanner system«
spin coating process result«
simplest exposure system«
significant undercutting«
root word photo«
robotic wafer track system«
resolution lithographic step«
residue.by rex photography«
rca clean procedure«
raster scan manner«
purge equipment«
proximity printer«
proximity mask«
projection exposure system«
platemaking process«
photoresist structure«
photoresist removal«
photoresist application«
photolithography share«
photolithographic cycle«
peb time«
oskar süß«
modern cmos wafer«
modern cleanrooms«
mid-1990s cymer inc.«
maskless lithography project«
louis plambeck jr.«
lithography equipment manufacturer«
liquid immersion technique«
limestone printing plate«
lambda physik«
index immersion lithography«
illuminated mask«
hg lamp«
gigaphoton inc.«
future ion implantation«
f2 excimer laser«
excimer laser source«
excimer laser lithography machine«
excimer laser light source«
excess photoresist solvent«
euv energy«
etching resist«
entire surface cost«
effective na«
dycryl polymeric letterpress plate«
defectivity anisotropic dry«
deep ultraviolet excimer laser«
current exposure system«
constructive interference pattern«
computerized data file«
clean operating condition«
chemical lithography«
bead removal«
aqueous developer«
antireflective material«
amazing optical feat«
alternative lightsource«
uniformity«
plasma«
etching«
xenon plasma«
wet chemical treatment«
usual air gap«
typical aspect ratio«
superb resistance«
steady dc current«
projection mask«
precise beam«
permanent photoetching«
mosfet fabrication«
microelectronics production«
ion projection lithography«
inorganic contamination«
hard bake«
halide gas«
free developer«
dominant lithography technology«
dense feature«
conventional uv«
collapse effect«
coherent extreme uv«
beam writer«
art photolithography tool«
optic«
wide angle image«
uv lithography«
uniform thin layer«
specific gas mixture«
projection lithography«
polymer soluble«
peb.«
nicephore niepce«
minimum feature«
macroscale process«
lithography system«
laser writer«
kanti jain«
k1 factor«
eximer laser«
dry etching technique«
denser chip«
deep ultraviolet lithography«
basic developer«
topography«
quality beam«
photoresist layer«
mechanical modelling«
magnetolithography«
lumonics«
ibm site«
extreme uv«
exposure bake«
euv source«
chemical mechanical polishing«
edge«
xaser«
wet chemical etching«
wafer foundry«
photo resist«
phenomenal advance«
negative photoresist«
material beneath«
krf laser«
arbitrary wavelength«
focus«
unexposed region«
sensitive alternative«
precision version«
photoresist pattern«
diazonaphthoquinone«
bis(trimethylsilyl)amine«
lamp«
tmah«
optical mask«
nanochannel glass material«
exposure pattern«
etch process«
ashing«
single spectral line«
hexamethyldisilazane«
euv light«
contact printer«
argon fluoride laser«
quartz substrate«
prototyping process«
faster chip«
exact control«
undesirable contaminant«
inexpensive hardware«
deionised water«
die«
print feature«
pen nanolithography«
natural asphalt«
multiple patterning«
krypton fluoride laser«
complete pattern«
adhesion promoter«
photolithographic process«
deep ultraviolet«
tetramethylammonium hydroxide«
multiple laser«
illumination light«
uniform light«
flat substrate«
dry etching«
chip manufacturing«
absorption characteristic«
tool technology«
it main disadvantage«
familiar technique«
temperature sufficient«
graphy«
final thickness«
method«
ray lithography«
ar2«
technological perspective«
feature«
soft lithography«
strong peak«
sensitive chemical«
micrometres thick«
photographic developer«
i.b.m.«
single iteration«
flat layer«
plasma etching«
lithographic printing«
duv«
dominant supplier«
suitable solvent«
opposite manner«
liquid solvent«
gate oxide«
beam«
size«
photomasks«
peb«
ray device«
special solution«
mirror«
experimental tool«
hotplate«
wave phenomenon«
primary manufacturer«
euv«
discharge lamp«
ultraviolet range«
substrate material«
semiconductor fabrication«
coherent light«
litho«
advanced machine«
feature size«
material change«
electron beam lithography«
spot size«
critical dimension«
modern process«
commercial process«
other solution«
alternative type«
uppermost layer«
stereolithography«
microfabrication«
pioneering development«
basic procedure«
optical resolution«
advanced treatment«
viscous force«
printing method«
liquid solution«
ray spectrum«
gas«
threshold voltage«
coherent«
acid bath«
chemical change«
scale integration«
light system«
procedure«
subsequent stage«
intense light«
thin coating«
hot plate«
trichloroethylene«
metal«
dioxide«
vacuum system«
printing plate«
trivial matter«
reticle«
photography«
nanometre«
photographic process«
microelectromechanical system«
strong incentive«
production environment«
economic consideration«
design method«
dimensional shape«
bottom layer«
commercial life«
band gap«
primary tool«
temperature«
vlsi«
advance«
vacuum pump«
xe«
synchrotron«
chemical treatment«
incident light«
volume production«
sodium ion«
free electron«
naoh«
noble gas«
development«
closest rival«
strong acid«
line«
energy loss«
spectral line«
challenge«
crucial factor«
chemical agent«
new trick«
surface layer«
experimental method«
technique«
major milestone«
shape«
xenon«
significant challenge«
modern technique«
micrometres«
sodium hydroxide«
geometric pattern«
top layer«
stone«
surface«
diffraction«
acetone«
greek origin«
laser beam«
essential role«
thin film«
modern system«
series«
hydrogen peroxide«
denser«
thick layer«
ultraviolet light«
throughput«
methanol«
circuit board«
chromium«
judea«
broad spectrum«
introduction«
adhesion«
square root«
car«
fundamental principle«
current research«
uv«
electric field«
stripper«
primary reason«
lifting«
critical role«
ability«
manner similar«
polygon«
commercialization«
evaporation«
chrome«
spinner«
direct contact«
photon«
lower cost«
solvent«
volt«
silicon«
coating«
bump«
sodium«
dip«
decade«
dy«
fabrication«
low cost«
minute«
wax«
common type«
contamination«
shortcoming«
offset lithography«
chromolithography«
lithographer«
lithograph machine«
lithograph«
193nm lithography«
193nm wavelength«
65nm feature size node«
193nm excimer laser lithography technology«
193nm arf excimer laser«
157nm technology«
1-methyl-2-pyrrolidone«
157nm wavelength«
50-year history«
Senefelder«
Nathaniel Currier«
James Merritt Ives«
James Ives«
Ives«
Honore Daumier«
Daumier«
Currier«
Aloys Senefelder«
Alois Senefelder«

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